Micro Patterning | FEMTOSOLUTION

SOLUTION / PATTERNING

펨토초 레이저를 이용하여 미세 패턴, 정밀 표면 구조 및 다양한 형상의 Micro Structure를 구현합니다.

소재와 패턴 형상에 따라 레이저 조건과 가공 경로를 최적화하여 정밀 Patterning 공정을 개발합니다.

12-inch Si Wafer Alignment Marking

Material: 12-inch Silicon Wafer
Thickness: Wafer Ø304.8 mm / Marking Area 200 × 200 mm / Position Accuracy ±2 µm
Target: 12-inch Si Wafer Alignment Marking

Two-Point Auto Alignment Patterning

Material: 12-inch Silicon Wafer / Various Substrates
Thickness: Two-Point Alignment / Angular Resolution 0.001° / Area 500 × 500 mm / Position Accuracy ±2 µm
Target: Two-Point Auto Alignment Patterning

500 µm Glass Micro Ruler Patterning

Material: Slide Glass
Thickness: Scale Length 500 µm / Graduation 10 µm / Line Width Approx. 2 µm
Target: 500 µm Glass Micro Ruler Patterning

Micro QR Code Marking

Material: Glass
Thickness: N/A
Target: 50–300 µm Micro QR Code Marking on Glass

Glass Micro Patterning

Material: Glass
Thickness: 0.1 mm
Target: 2 µm Spot Glass Micro Patterning

Matchstick Micro Marking without Ignition

Material: Matchstick Head · Heat-Sensitive Coated Material
Thickness: 성냥 머리 표면 FS 로고 마킹 · CO₂ 레이저 비교 시연
Target: Matchstick Micro Marking without Ignition

200 µm Glass Microfluidic Channel Patterning

Material: Slide Glass
Thickness: Channel width approx. 200 µm · Channel depth approx. 20 µm
Target: 200 µm Glass Microfluidic Channel Patterning